|
APPLICATIONS
|
INDUSTRY
(FACILITY)
|
SERVICE
|
PARAMETER
|
RANGE
|
BACKGROUND
|
TELEDYNE MODEL
|
Bulk gas analysis
|
Ultra high purity inert gases used in fabrication of wafers
|
PPB O2
|
0-50 ppb
|
UHP - N2, H2, AR and He
|
3060e / Ultra Trace
|
1. Gas phase etching - blanketing
2. Annealing furnace - blanketing
3. Deposition of Dopant - carrier gas
4. Pipe line verification - leak check
5. Analysis at point of use - at tool location
|
Ecrimer laser system
|
Laser exciter / F2 mixer gases
|
Percent F2
|
0-2, 0-7%
|
He or Neon
|
6000
|
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